Description
The CleanAIR A2P3 Filter is a combination gas and particulate filter designed for effective respiratory protection. It fits CleanAIR Chemical 2F PAPR systems and the GX02 full face mask.
Key features
- Filters organic gases and vapours with boiling points above 65°C
- Protects against a wide range of hydrocarbons and organic solvents
- Combines gas filtration with particle protection for dual safety
- Dimensions: 110 mm diameter by 95 mm height
- Lightweight at 325 grams for comfortable use
- Requires two filters for Chemical 2F PAPR systems and one for GX02 mask
Applications
- Chemical plants handling organic solvents and vapours
- Industrial sites exposed to hydrocarbons and airborne particles
- Laboratories requiring protection from organic gases and dust
- Painting and coating operations needing gas and particulate safety
Alternative options
- CleanAIR A2 Filter: Protects against organic gases and vapours above 65 °C only.
- CleanAIR B2P3 Filter: Protects against inorganic gases, vapours, and particulates.
- CleanAIR A2B2E2K2P3 Filter: Multi-gas and particulate protection for complex environments.
- CleanAIR A3AXP3 Filter: Handles all organic vapours and particulates, including low-boiling ones.
- CleanAIR P3 Filter: Provides high-efficiency filtration for airborne particles only.
- CleanAIR P3 Filter – Zero: P3 filter with emergency backup via dual-thread design.
Recommended pairings
- CleanAIR Chemical 2F Respiratory Starter Kit Comfort: Perfect PAPR system; ensures powered airflow for the filter.
- CleanAIR Chemical 2F Respiratory Starter Kit Decon: Easy-clean PAPR unit enhances safety with the filter.
- CleanAIR Chemical 2F EX Model: Durable, explosion-safe PAPR system pairs well with the Filter.
- CleanAIR GX02 Full Face Mask: Seals fully and works with one filter.
For detailed product specifications, features, and safety standards, download the full datasheet here: Product Information Card, Matrix of Respiratory Options.
This CleanAIR A2P3 Filter delivers reliable dual protection against gases and particles in demanding environments.